CD-SEM：Critical Dimension SEM (CD
Critical Dimension SEM (CD
VeritySEM 10 關鍵尺寸(CD) 量測
https://www.appliedmaterials.c
在半導體元件圖案測量方面，CD-SEM (臨界線寬掃描式電子顯微鏡) 常被稱為是「晶圓廠的標準」，因為這套系統能產生最精準的次奈米測量值。在微影成像機（lithography ...
CD
https://www.hitachi-hightech.c
Wafer surface inspection system to detect various types of small defects on non-patterned wafer of next generation device. 上 ...
4. CD
https://www.hitachi-hightech.c
CD-SEM is a dedicated system for measuring the dimensions of the fine patterns on a semiconductor wafer.
In
https://www.tsri.org.tw
In-line SEM主要用途為線上產品線寬量測，又稱CD-SEM，其特點為WAFER無須經過切片或鍍金屬膜等預處理步驟，即可觀察及量測光阻、絕緣層及金屬層等之圖案，本量測設備屬於非 ...
檢測10奈米以下半導體CD
https://www.mem.com.tw
多年來，業界一直使用微距量測掃描式電子顯微鏡(CD-SEM)來進行量測，此種顯微鏡會射出電子束，與要掃描的材料作用，然後回傳訊號，再由量測機台比對運算 ...
CD
https://www.advantest.com
Our CD-SEM tools measure the width, height, sidewall angle, etc. of wiring patterns on semiconductor photomasks and wafers.
CD-SEM
https://semiengineering.com
CD-SEM, or critical-dimension scanning electron microscope, is a tool for measuring feature dimensions on a photomask.
VeritySEM 10 Critical Dimension (CD) Metrology
https://www.appliedmaterials.c
CD-SEMs are used to measure the critical dimensions of patterns, such as lines and spaces, once the lithography scanner transfers them from mask to photoresist.