Reticle field layout：Reticle Enhancement Technology Trends
Reticle Enhancement Technology Trends
由WGrobman著作·2001·被引用17次—ABSTRACT.Inthispaper,wedescribetheindustrytrendsthatrequirereticleenhancementtechnologyduringmaskdatapreparation,aswellas.。其他文章還包含有：「1Xreticlelayoutforaninterposersplitintotwo...」、「MaskReticle」、「Photomask」、「ReticleShotMapTutorial」、「Systemandmethodfortheonlinedesignof...」、「Systemandmethodfortheonlinedesignofareticlefield...」、「ULSIManuf...
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1X reticle layout for an interposer split into two ...
https://www.researchgate.net
Figure 2 shows the layout for a 1x reticle that supports placing multiple fields on one plate. Here the top half of the interposer (purple) is field 1 on the ...
Mask Reticle
https://en.wikichip.org
A reticle has to be stepped and repeated in order to expose the entire wafer. In other words, compared to a reticle, a mask used to refer to a ...
Photomask
https://en.wikipedia.org
A photomask is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in ...
Reticle Shot Map Tutorial
https://www.youtube.com
System and method for the online design of ...
https://patents.google.com
Provided are a system and method for creating a reticle field layout (RFL). In one example, the method includes receiving information for a RFL design by a ...
System and method for the online design of a reticle field ...
https://www.freepatentsonline.
DETAILED DESCRIPTION · 100 enables the creation, storage, and validation of a reticle field layout (RFL) design for an integrated circuit (IC).
ULSI Manufacturing Technology
https://www.ee.nsysu.edu.tw
For steppers and step- and-scan systems, each reticle pattern is aligned and exposed at multiple locations as the aligner steps across the wafer. Each field ...
光罩
https://zh.wikipedia.org
光罩（英語：Reticle, Mask）：在製作積體電路的過程中，利用光蝕刻技術，在半導體上形成圖型，為將圖型複製於晶圓上，必須透過光罩作用的原理。