High-k metal gate:32奈米以下IC半導體性能提昇的重要推手
32奈米以下IC半導體性能提昇的重要推手
高介電常數金屬閘極(High
https://www.matek.com
這類金屬閘極和高介電常數的絕緣氧化物都是多元素交錯沉積的層狀結構,其中每層材料的厚度極薄,通常都在1-2 nm 以下,因此在層狀厚度、介面平整度和成份鑑定 ...
High
https://en.wikipedia.org
High-κ dielectrics are used in semiconductor manufacturing processes where they are usually used to replace a silicon dioxide gate dielectric or another ...
High
https://www.sciencedirect.com
This review covers both scientific and technological issues related to the high-K gate stack – the choice of oxides, their deposition, their structural and ...
Definition of High
https://www.pcmag.com
Intel's High-K/Metal Gate technology enabled elements on a chip to be reduced to 45 nm with stability. SiGe stands for silicon germanium.
High
https://www.intel.com
High-k stands for high dielectric constant, a measure of how much charge a material can hold. Air is the reference point for this constant and has a k of ...
先進High
https://www.airitilibrary.com
摘要. 經過多年的發展與研究,高介電係數(high-k)絕緣層取代傳統SiO2絕緣層是一種有效的方式去解決閘極漏電問題,特別是HfO2。
High
https://www.brewerscience.com
This new technology incorporates a high-k dielectric, which reduces leakage and improves the dielectric constant. To help with fermi-level pinning and to allow ...
High
https://ieeexplore.ieee.org
High-k dielectrics and metal gate electrodes have entered complementary metal-oxide-semiconductor (CMOS) logic technology, integrated in both gate-first and ...
[Device Part1] High
https://www.youtube.com