MA6 Mask Aligner：SUSS MA6 Mask Aligner
SUSS MA6 Mask Aligner
Itconsistsoftwoindependentvideomicroscopespositionedbelowthesubstrate.Apatentedtechniqueusingvideoframestoringisusedforalignment.Alignment ...。其他文章還包含有：「曝光機(MA6)」、「光罩對準曝光機(MaskAligner德國Karl」、「KarlSussMA6MaskAligner」、「SUSSMA6MaskAlignerforPhotolithography」、「MaskAligner」、「MA6MA8」、「KARLSUSSMA6BA6MaskAlignerUsersManual」
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曝光機(MA6)
https://nems.ntu.edu.tw
光罩載台大小：3”~4” (載台最大曝光範圍4“) · 晶圓大小：~4” · 可曝光區域：4 · 汞燈：350 W · 曝光波段：I (365nm)、H (405nm)、G (436nm) line · 曝光強度：現場標示 · 對準系統：雙 ...
光罩對準曝光機(Mask Aligner 德國Karl
https://web.phys.ntu.edu.tw
光罩對準曝光機(Mask Aligner 德國Karl-Suss)操作程序. 1、在使用登記表登錄使用人及開機時間。 2、打開右邊鐵架上之汞燈電源(須熱機20 分鐘以上，光源才會穩定)。 3 ...
Karl Suss MA6 Mask Aligner
https://www.inrf.uci.edu
The Karl Suss Mask Aligner performs high resolution photolithography. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of ...
SUSS MA6 Mask Aligner for Photolithography
https://aggiefab.tamu.edu
The SUSS MA6 is a mask aligner designed for high-resolution photolithography at the micrometer scale. Wafer size: up to 4”. Mask size: up to 5”.
Mask Aligner
https://www.suss.com
The SUSS MicroTec Mask Aligner has become synonymous with superior quality, high alignment accuracy, and sophisticated exposure optics. SUSS MicroTec offers a ...
MA6 MA8
https://www.cnfusers.cornell.e
The SUSS MA6 Mask Aligner is designed for high resolution photolithography ... Select between mask align- (MA6) and bond align-. (BA6) operation mode ...
KARL SUSS MA6BA6 Mask Aligner Users Manual
https://www.nist.gov
OVERVIEW: • UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength available. Contact super-use for installing I-line or G-line filters.