Atomic layer deposition:Atomic layer deposition
Atomic layer deposition
Atomiclayerdeposition(ALD)isathin-filmdepositiontechniquebasedonthesequentialuseofagas-phasechemicalprocess;itisasubclassofchemical ...。其他文章還包含有:「Abriefreviewofatomiclayerdeposition」、「ALD(AtomicLayerDeposition)」、「AtomicLayerDeposition(ALD)」、「AtomicLayerDeposition」、「AtomicLayerDeposition」、「AtomicLayerDeposition」、「WhataretheDifferentTypesofAtomicLayerDeposition...」...
查看更多 離開網站A brief review of atomic layer deposition
https://www.sciencedirect.com
Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting ...
ALD (Atomic Layer Deposition)
https://www.asm.com
Atomic Layer Deposition (ALD) is a surface-controlled layer-by-layer process that results in the deposition of thin films one atomic layer at a time. EmerALD® ...
Atomic Layer Deposition (ALD)
https://plasma.oxinst.com
Atomic Layer Deposition (or ALD) is an advanced deposition technique that allows for ultra-thin films of a few nanometres to be deposited in ...
Atomic Layer Deposition
https://www.sciencedirect.com
Atomic layer deposition (ALD) is a chemical gas phase thin film deposition method based on sequential, self-saturating surface reactions [1–5]. Two or more ...
Atomic Layer Deposition
https://www.sciencedirect.com
Atomic Layer Deposition
https://pubs.acs.org
Atomic layer deposition (ALD) has emerged as an important technique for depositing thin films for a variety of applications.
What are the Different Types of Atomic Layer Deposition ...
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Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor ...
原子層沉積系統(Atomic Layer Deposition
https://cptft.mcut.edu.tw
原子層沉積(Atomic Layer Deposition, ALD)係藉由表面獨特自我侷限反應來成長高階梯覆蓋與大面積均勻性之薄膜。可用於奈米級或原子級薄膜沉積,調控 ...
說明
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