FN tunneling direct tunneling：Chapter 2 Basic Principle of Nonvolatile Memory 2.1 Introduction
Chapter 2 Basic Principle of Nonvolatile Memory 2.1 Introduction
由葉睿龍著作·2007—DirectTunnelingistheflowofelectronsthroughthefulloxidethicknessillustratedinFigure2-4(a).Fornanocrystalmemories,thecontrol-gatecoupling ...。其他文章還包含有：「5.3QuantumMechanicalTunneling」、「Fowler-NordheimTunneling」、「HotCarrierDegradation—Physics」、「ReliabilityPhysicsofNanoelectronicDevicesLecture20...」、「RetentionCharacteristicofSONOSMemoryCellSONOS記憶...」、「...
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5.3 Quantum Mechanical Tunneling
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1.1 Fowler-Nordheim Tunneling. The energy band conditions for Fowler-Nordheim tunneling, which is a special case of direct tunneling, are depicted in Figure 5.4 ...
Fowler-Nordheim Tunneling
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Fowler-Nordheim (FN) tunneling is characterized by (1) the triangular shape barrier [62], and (2) tunneling to occur through only a part of the insulator layer.
Hot Carrier Degradation—Physics
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Reliability Physics of Nanoelectronic Devices Lecture 20 ...
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The tunneling mechanism involved in TDDB of thin oxides is Fowler – Nordheim (FN) tunneling while for very thin oxides, its direct tunneling (DT) ...
Retention Characteristic of SONOS Memory Cell SONOS 記憶 ...
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穿隧分為兩大機制，一是直接穿隧(Direct-Tunneling)，. 二是F-N 穿隧(Fowler-Nordheim Tunneling)。直接穿隧的電子不需要比能障(Energy Barrier)能. 量高，就有穿過能障的 ...
Tunneling
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Direct tunneling through thin layers of oxide in very thin gates. ... when a high bias is applied to a thicker gate oxide (Fowler-Nordheim tunneling).