APM Clean:濕式化學品在半導體製程中之應用
濕式化學品在半導體製程中之應用
![Cleaning Technology in Semiconductor Device ...](https://i0.wp.com/api.multiavatar.com/Cleaning+Technology+in+Semiconductor+Device+....png?apikey=viVnb6N20jclO8)
Cleaning Technology in Semiconductor Device ...
https://www.electrochem.org
APM cleaning is very effective to remove particles from silicon wafer ... The original RCA cleaning cycle consists of 2 steps (APM and HPM cleaning).
![RCA clean 製程](https://i0.wp.com/api.multiavatar.com/RCA+clean+%E8%A3%BD%E7%A8%8B.png?apikey=viVnb6N20jclO8)
RCA clean 製程
http://www.gptc.com.tw
常用化學品有SC-1(APM)、SC-2(HPM)、SPM、HF及BHF等,其成份與功能如下表所示。SC1及SC2最早由RCA公司所發明用於清洗製程,所以SC-1及SC-2又稱RCA-1及RCA-2。
![TWI409862B](https://i0.wp.com/api.multiavatar.com/TWI409862B+-+%E5%9C%A8%E5%96%AE%E6%99%B6%E5%9C%93%E8%A3%BD%E7%A8%8B%E4%B8%AD%E7%94%A8%E6%96%BC%E6%BD%94%E6%B7%A8%E6%99%B6%E5%9C%93%E4%B9%8B%E6%BD%94%E6%B7%A8%E6%96%B9%E6%B3%95%E5%8F%8A%E6%BA%B6%E6%B6%B2.png?apikey=viVnb6N20jclO8)
TWI409862B
https://patents.google.com
有時候該SC1溶液也可稱為「APM溶液」,其係代表氨水-過氧化氫混合物(Ammonia hydrogen Peroxide Mixture)。該SC1溶液主要係用於移除微粒和殘留的有機污染。
![Wafer Cleaning Process](https://i0.wp.com/api.multiavatar.com/Wafer+Cleaning+Process.png?apikey=viVnb6N20jclO8)
Wafer Cleaning Process
https://www.modutek.com
SC1 clean process uses the APM solution (ammonia hydroxide-hydrogen peroxide water mixture) of the RCA cleaning method which removes organic matter and ...
![工學院半導體材料與製程設備學程](https://i0.wp.com/api.multiavatar.com/%E5%B7%A5%E5%AD%B8%E9%99%A2%E5%8D%8A%E5%B0%8E%E9%AB%94%E6%9D%90%E6%96%99%E8%88%87%E8%A3%BD%E7%A8%8B%E8%A8%AD%E5%82%99%E5%AD%B8%E7%A8%8B+-+%E5%9C%8B%E7%AB%8B%E4%BA%A4%E9%80%9A%E5%A4%A7%E5%AD%B8.png?apikey=viVnb6N20jclO8)
工學院半導體材料與製程設備學程
https://ir.nctu.edu.tw
Mixtures (APM) cleaning process in Deep Trench DRAM. 研究生: 李國智 ... In this thesis, clean solution of dulite APM(UAUmmonia (NH4OH ) and.
![微影光罩的不同清洗方法的效果比較](https://i0.wp.com/api.multiavatar.com/%E5%BE%AE%E5%BD%B1%E5%85%89%E7%BD%A9%E7%9A%84%E4%B8%8D%E5%90%8C%E6%B8%85%E6%B4%97%E6%96%B9%E6%B3%95%E7%9A%84%E6%95%88%E6%9E%9C%E6%AF%94%E8%BC%83+-+%E5%9C%8B%E7%AB%8B%E4%BA%A4%E9%80%9A%E5%A4%A7%E5%AD%B8.png?apikey=viVnb6N20jclO8)
微影光罩的不同清洗方法的效果比較
https://ir.nctu.edu.tw
RCA Standard Clean 1(SC-1:standard chemical 1,又稱APM: ammonium peroxide mixture;NH4OH+H2O2+ H2O 於65~80℃)氫氧. 化銨+過氧化氫+去離子水混合物;SC-1 為 ...
![最常使用之晶圓表面清潔步驟為濕式化學法(wet chemistry)](https://i0.wp.com/api.multiavatar.com/%E6%9C%80%E5%B8%B8%E4%BD%BF%E7%94%A8%E4%B9%8B%E6%99%B6%E5%9C%93%E8%A1%A8%E9%9D%A2%E6%B8%85%E6%BD%94%E6%AD%A5%E9%A9%9F%E7%82%BA%E6%BF%95%E5%BC%8F%E5%8C%96%E5%AD%B8%E6%B3%95%28wet+chemistry%29.png?apikey=viVnb6N20jclO8)
最常使用之晶圓表面清潔步驟為濕式化學法(wet chemistry)
https://www.tsri.org.tw
SC-1(APM). 氫氧化氨/過氧 ... 目前工業界所採行之標準濕式清潔步驟稱為RCA 清潔法(RCA Clean), 係於1960 年代 ... 標準清潔液1(standard clean 1)為NH4OH/H2O2/H2O.
![第一章緒論](https://i0.wp.com/api.multiavatar.com/%E7%AC%AC%E4%B8%80%E7%AB%A0%E7%B7%92%E8%AB%96.png?apikey=viVnb6N20jclO8)
第一章緒論
https://ir.nctu.edu.tw
NH4OH/H2O2/H2O 主要是應用在微. 粒子之清除。利用NH4OH 之弱鹼性來活化Si 晶片的表層,將附著於表面之微粒.
![辛耘知識分享家](https://i0.wp.com/api.multiavatar.com/%E8%BE%9B%E8%80%98%E7%9F%A5%E8%AD%98%E5%88%86%E4%BA%AB%E5%AE%B6%3A%E6%B8%85%E6%B4%97%E8%A3%BD%E7%A8%8B%E4%BB%8B%E7%B4%B9%28Wet+Clean+Process%29.png?apikey=viVnb6N20jclO8)
辛耘知識分享家
https://www.scientech.com.tw
SC-1 (APM):去除有機污染物(有機物+顆粒清潔); SC-2 (HPM):去除離子污染(ionic clean); DHF:去除薄氧化層(氧化層); BOE (Buffered Oxide ...