Photosensitive polyimide：Recent Progress of Photosensitive Polyimides

Recent Progress of Photosensitive Polyimides

由KFukukawa著作·2008·被引用129次—Photosensitivepolyimides(PSPIs)havebeenattractinggreatattentionasinsulatingmaterialsinmicroelectronicindustry,and.。其他文章還包含有：「Investigatingthestructure–sensitivityrelationshipof...」、「Low」、「Negative」、「PhotosensitivePolyimide(PSPI)」、「Photosensitivepolyimide」、「Synthesisandcharacterizationofaphotosensitive...」、「感光型聚醯亞胺(Photosensit...

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Investigating the structure–sensitivity relationship of ...

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Photosensitive polyimides (PSPIs) have been widely used in the buffer coating layer and insulation layer due to their excellent thermal and ...

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Low

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Photosensitive polyimide-precursor based on polyisoimide: Dimensionally stable polyimide with a low dielectric constant. Polymer 1999, 40, 551–558. [Google ...

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Negative

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Negative-tone photosensitive polyimides (n-PSPI) with high transparency at visible wavelength region (400–700 nm) were prepared by dissolving ...

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Photosensitive Polyimide (PSPI)

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Photosensitive polyimides (PSPIs) are attracting much attention as an insulating materials for microelectronic applications. PSPIs can be directly patterned ...

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Photosensitive polyimide

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Abstract. A positive-working photosensitive polyimide (PI) precursor based on fluorinated polyisoimide (FPII) and 2,3,4-tris(1-oxo-2-diazonaphthoquinone-5- ...

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Synthesis and characterization of a photosensitive ...

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Abstract. Photosensitive polyimide (PSPI) is of great interest, especially in microelectronic industry and potentially in the photonics and MEMS applications.

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