CD SEM threshold:CD-bias reduction in CD
CD-bias reduction in CD
2015年3月26日—Useofthethresholdmethodwithathresholdlevelequalto50%(Th=50%)isshowntobeeffectiveforsuppressingthedependenceofCDbiason ...。其他文章還包含有:「4.CD」、「CDbiasreductioninCD」、「CD-SEM」、「DeterminationofoptimalparametersforCD」、「InvestigatingSEM」、「QuantifyingCD」、「從散射測量對微影線上製程控制的研究」、「接触孔关键尺寸测量研究与工序能力提高」
查看更多 離開網站4. CD
https://www.hitachi-hightech.c
CD-SEM is a dedicated system for measuring the dimensions of the fine patterns on a semiconductor wafer.
CD bias reduction in CD
https://www.researchgate.net
The measurement accuracy of critical-dimension scanning electron microscopy (CD-SEM) at feature sizes of 10 nm and below is investigated and methods for ...
CD-SEM
https://semiengineering.com
Near Threshold Computing. Optimizing power by computing below the minimum operating voltage. Near-Memory Computing. Moving compute closer to memory to reduce ...
Determination of optimal parameters for CD
https://tsapps.nist.gov
Four edge detection algorithms were used: • Maximum derivative (MAXD), based on a threshold algorithm. • Regression-to-baseline (REGR), based on fitting the ...
Investigating SEM
https://hal.science
arbitrary 2% threshold was enough to discriminate between obvious and not obvious measurement errors. This corresponds approximately to ...
Quantifying CD
https://www.spiedigitallibrary
One common approach for contour detection is the application of a threshold to the image that determines which pixels belong to a contact and ...
從散射測量對微影線上製程控制的研究
https://ndltd.ncl.edu.tw
本論文嘗試探討散射測量法(Scatterometry) 的光學參數測量法與SEM的匹配性,並使用整合於Track機台中光學量測技術,搭配CD最佳化的運算軟體,利用其即時、便利的特性,直接 ...
接触孔关键尺寸测量研究与工序能力提高
http://ep.org.cn
CD-SEM 作为CD 的重要测量方式已经在大规模. 集成电路制造生产线广泛应用多年,随着 ... (1) 阈值设定(Threshold): Threshold 是CD-SEM. 测量中一个非常重要的参数,其基本 ...