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Reticle size

「Reticle size」文章包含有:「1Xreticlelayoutforaninterposersplitintotwofields....」、「DesignsBeyondTheReticleLimit」、「DieSizeAndReticleConundrum–CostModelWith...」、「MaskReticle」、「Photomask」、「TSMCandBroadcomEnhancetheCoWoSPlatformwith...」、「TSMCPreps6xReticleSizeSuperCarrierInterposer...」、「光罩」、「日月光VIPack™系列FOCoS」

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1X reticle layout for an interposer split into two fields. ...
1X reticle layout for an interposer split into two fields. ...

https://www.researchgate.net

The reticle size is 150 by 150mm. This reticle can then be used on the lithography stepper to image the full interposer on the wafer by alternating the ...

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Designs Beyond The Reticle Limit
Designs Beyond The Reticle Limit

https://semiengineering.com

The industry, far from giving up, is exploring new ways to enable designs to go beyond the reticle size, which is around 800mm square. Some ...

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Die Size And Reticle Conundrum – Cost Model With ...
Die Size And Reticle Conundrum – Cost Model With ...

https://www.semianalysis.com

On the left is a wafer full of dies that are 25mm by 32mm, 800mm2. On the right is a wafer full of dies that are 13.5mm by 32mm, 432mm2. The 2 ...

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Mask  Reticle
Mask Reticle

https://en.wikichip.org

Current i193 and EUV lithography steppers have a maximum field size of 26 mm by 33 mm or 858 mm². In future High-NA EUV lithography steppers the ...

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Photomask
Photomask

https://en.wikipedia.org

The reticle was originally a 10X larger image of a single chip. ... size the same as the final chip. The photomask ... dimensions on photomasks which are the ...

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TSMC and Broadcom Enhance the CoWoS Platform with ...
TSMC and Broadcom Enhance the CoWoS Platform with ...

https://pr.tsmc.com

... reticle size interposer. With an area of approximately 1,700mm2, this next generation CoWoS interposer technology significantly boosts ...

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TSMC Preps 6x Reticle Size Super Carrier Interposer ...
TSMC Preps 6x Reticle Size Super Carrier Interposer ...

https://www.anandtech.com

The theoretical EUV reticle limit is 858mm2 (26 mm by 33 mm), so six of these masks would enable SiPs of 5148 mm2.

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光罩
光罩

https://zh.wikipedia.org

光罩上的圖形縮小4~10倍(現代微影機一般都是縮小4倍)後透射在晶圓表面。為了區別接觸式曝光中使用的光罩,投影式曝光中使用的光罩又被稱為倍縮式光罩(reticle ...

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日月光VIPack™系列FOCoS
日月光VIPack™系列FOCoS

https://www.aseglobal.com

兩個FOCoS-Bridge結構均包含1顆主晶片, 4顆HBM和4顆橋接的Bridges,有效地將9個元件集成在47mm x 31mm尺寸的扇出型封裝體中,幾乎兩倍的光罩尺寸(Reticle ...