Attenuated phase shift mask:Attenuated phase shift masks

Attenuated phase shift masks

Attenuated phase shift masks

由AErdmann著作·2022·被引用22次—Wereviewpublishedresearchonattenuatedphaseshiftmasks(attPSM)forEUVwithspecialemphasisonmodelingandfundamentalunderstandingoftheimaging ...。其他文章還包含有:「AlternatingAperturePhaseShiftMasks」、「AttenuatedphaseshiftmasksusingMoSiasanopaquelayer」、「attenuatedphase」、「Phase」、「Phase」、「US5928813A」、「用於次25奈米極紫外光曝光機之新穎反射型衰減式相位移...

查看更多 離開網站

Phase shift maskHalf Tone maskPhotomask半導體光罩廠商psm光罩相位移光罩原理Phase maskphase shift mask原理光罩是做什麼的光罩廠排名半導體光罩製程ppt
Provide From Google
Alternating Aperture Phase Shift Masks
Alternating Aperture Phase Shift Masks

https://www.photomask.com

We offer two distinct PSM technologies: Embedded Attenuated Phase Shift Masks (EAPSM) and Alternating Aperture Phase Shift Masks (AAPSM).

Provide From Google
Attenuated phase shift masks using MoSi as an opaque layer
Attenuated phase shift masks using MoSi as an opaque layer

https://ieeexplore.ieee.org

This paper will discuss the use of MoSi for attenuated PSMs. This approach has the advantage over the use of an SOG/Cr combination, that only a single dry etch ...

Provide From Google
attenuated phase
attenuated phase

https://opg.optica.org

The attenuated phase-shift mask (Att. PSM) is a resolution enhancement technique, and its absorber is composed of a semi-transparent absorption ...

Provide From Google
Phase
Phase

https://en.wikipedia.org

Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography.

Provide From Google
Phase
Phase

https://spie.org

This type of PSM is generally called a “weak” shifter—it provides only a portion of the full resolution and depth of focus potential of alternating PSM. Its great advantage is the simplicity and low cost of replacing chrome on glass (COG) masks, the non-

Provide From Google
US5928813A
US5928813A

https://patents.google.com

An attenuated phase shift mask comprises a first layer having a thickness to provide a transmission in the range of about 3 to 10% formed on a transparent ...

Provide From Google
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩

https://www.tiri.narl.org.tw

相位移光罩(phase-shifting-mask) 是目前一種極為重要的解析度增益技術,它將被應用於未來. 的極紫外光(EUV) 微影術中,以製作25 nm 以下的圖案。

Provide From Google
相轉移光罩技術
相轉移光罩技術

https://www.materialsnet.com.t

一般而言,相轉移光罩常被用來. 延伸現有曝光設備的壽命,例如使用I- line Stepper及I-line PSM以延後DUV. Scanner須要的時間,以節省成本。 接觸窗一般是整套光罩中最先使用.