Attenuated phase shift mask:attenuated phase
attenuated phase
2024年3月14日—Theattenuatedphase-shiftmask(Att.PSM)isaresolutionenhancementtechnique,anditsabsorberiscomposedofasemi-transparentabsorption ...。其他文章還包含有:「AlternatingAperturePhaseShiftMasks」、「AttenuatedphaseshiftmasksusingMoSiasanopaquelayer」、「Attenuatedphaseshiftmasks」、「Phase」、「Phase」、「US5928813A」、「用於次25奈米極紫外光曝光機之新穎反射型衰減式相位移光罩」、「相轉移光...
查看更多 離開網站Alternating Aperture Phase Shift Masks
https://www.photomask.com
We offer two distinct PSM technologies: Embedded Attenuated Phase Shift Masks (EAPSM) and Alternating Aperture Phase Shift Masks (AAPSM).
Attenuated phase shift masks using MoSi as an opaque layer
https://ieeexplore.ieee.org
This paper will discuss the use of MoSi for attenuated PSMs. This approach has the advantage over the use of an SOG/Cr combination, that only a single dry etch ...
Attenuated phase shift masks
https://www.spiedigitallibrary
We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the imaging ...
Phase
https://en.wikipedia.org
Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography.
Phase
https://spie.org
This type of PSM is generally called a “weak” shifter—it provides only a portion of the full resolution and depth of focus potential of alternating PSM. Its great advantage is the simplicity and low cost of replacing chrome on glass (COG) masks, the non-
US5928813A
https://patents.google.com
An attenuated phase shift mask comprises a first layer having a thickness to provide a transmission in the range of about 3 to 10% formed on a transparent ...
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩
https://www.tiri.narl.org.tw
相位移光罩(phase-shifting-mask) 是目前一種極為重要的解析度增益技術,它將被應用於未來. 的極紫外光(EUV) 微影術中,以製作25 nm 以下的圖案。
相轉移光罩技術
https://www.materialsnet.com.t
一般而言,相轉移光罩常被用來. 延伸現有曝光設備的壽命,例如使用I- line Stepper及I-line PSM以延後DUV. Scanner須要的時間,以節省成本。 接觸窗一般是整套光罩中最先使用.