Atomic layer deposition: an overview:Atomic layer deposition
Atomic layer deposition
Atomiclayerdeposition(ALD)isathin-filmdepositiontechniquebasedonthesequentialuseofagas-phasechemicalprocess;itisasubclassofchemical ...。其他文章還包含有:「AtomicLayerDeposition」、「AtomicLayerDepositionandAtomicLayerEtching—An...」、「AtomicLayerDeposition」、「AtomicLayerDeposition」、「AtomicLayerDeposition」、「AtomicLayerDeposition」、「Review—OnAtomicLayerDeposition」
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Atomic layer deposition (ALD) is a chemical gas phase thin film deposition method based on sequential, self-saturating surface reactions [1–5]. Two or more ...
Atomic Layer Deposition and Atomic Layer Etching—An ...
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Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes. Samiha Hossain,; Oktay H. Gokce &; N. M. Ravindra.
Atomic Layer Deposition
https://www.seas.upenn.edu
Atomic layer deposition (ALD) has emerged as an ... ALD and TiO2 ALD on ferritin also demonstrated that ALD ... This overview has presented a brief introduction to ...
Atomic Layer Deposition
https://pubs.acs.org
Amnon Rothman, Andreas Werbrouck, Stacey F. Bent. Enhanced Growth in Atomic Layer Deposition of Ruthenium Metal: The Role of Surface Diffusion ...
Atomic Layer Deposition
https://pubs.acs.org
ALD is a gas phase method based on sequential, self-limiting surface reactions. ALD can deposit very conformal and ultrathin films on substrates ...
Atomic Layer Deposition
https://www.researchgate.net
Atomic layer deposition (ALD) which has emerged as an important technique for depositing thin films for a variety of applications has been reported.
Review—On Atomic Layer Deposition
https://iopscience.iop.org
Atomic layer deposition (ALD) has emerged as a versatile and robust deposition technique for developing high quality nanomaterials with an ...