Phase mask:相轉移光罩技術

相轉移光罩技術

相轉移光罩技術

接觸窗一般是整套光罩中最先使用.相轉移光罩(PSM,Phase-ShiftMask)的;.常用型態有兩種,一為Rim-Type,另一.為AttenuatedType。1.Rim-Type.一般製造此型光罩是將 ...。其他文章還包含有:「0」、「AlternatingPhase」、「PhaseMask」、「Phasemasks」、「Phase」、「半導體器件用光掩模」、「用於次25奈米極紫外光曝光機之新穎反射型衰減式相位移光罩」

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0
0

https://www.einstinc.com

Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric (holographic) ...

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Alternating Phase
Alternating Phase

https://spie.org

A phase-shift mask relies on the fact that light passing through a transparent media will undergo a phase change as a function of its optical thickness, the ...

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Phase Mask
Phase Mask

https://www.sciencedirect.com

When exposed to UV light, the phase mask is designed to cancel the 0th order diffraction, while maximizing the +1 and –1 orders of diffraction, creating an ...

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Phase masks
Phase masks

https://ibsen.com

Phase masks are the production tool used to write gratings in fibers and waveguides. Ibsen Phase masks incorporate unbeatable, interferometric ( ...

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Phase
Phase

https://en.wikipedia.org

Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography.

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半導體器件用光掩模
半導體器件用光掩模

https://www.photomask.co.jp

移相掩模(Phase-Shifting Mask:PSM)指透過控制光的相位及透過率,改善對晶圓曝光時的分辨率及焦點深度(DOF:Depth of Focus),是提高了復刻特性的光掩模。對於曝光 ...

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用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩

https://www.tiri.narl.org.tw

相位移光罩(phase-shifting-mask) 是目前一種極為重要的解析度增益技術,它將被應用於未來. 的極紫外光(EUV) 微影術中,以製作25 nm 以下的圖案。