New development of atomic layer deposition process：Review of atomic layer deposition process
Review of atomic layer deposition process
由TJKunene著作·2022·被引用40次—Thesixstagesofprocessdevelopmentofatomiclayerdepositionare...Newdevelopmentofatomiclayerdeposition:processes,methodsandapplications.。其他文章還包含有：「Newdevelopmentofatomiclayerdeposition」、「(PDF)NewDevelopmentofAtomicLayerDeposition」、「Newdevelopmentofatomiclayerdeposition」、「AdvancesinAtomicLayerDeposition」、「RecentAdvancesinTheoreticalDevelopmentof...
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New development of atomic layer deposition
https://www.tandfonline.com
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
(PDF) New Development of Atomic Layer Deposition
https://www.researchgate.net
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
New development of atomic layer deposition
https://www.tandfonline.com
ABSTRACT. Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
Advances in Atomic Layer Deposition
https://link.springer.com
Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting ...
Recent Advances in Theoretical Development of Thermal ...
https://www.mdpi.com
Atomic layer deposition (ALD) is a vapor-phase technique to deposit thin-film materials on various substrates through sequential and self-limiting surface ...
Recent Developments of Atomic Layer Deposition ...
https://onlinelibrary.wiley.co
Deposition technologies for TCO films have been established using various techniques, such as magnetron sputtering, pulsed laser deposition, CVD ...