New development of atomic layer deposition process：Recent Advances in Theoretical Development of Thermal ...
Recent Advances in Theoretical Development of Thermal ...
由MShahmohammadi著作·2022·被引用27次—Atomiclayerdeposition(ALD)isavapor-phasetechniquetodepositthin-filmmaterialsonvarioussubstratesthroughsequentialandself-limitingsurface ...。其他文章還包含有：「Newdevelopmentofatomiclayerdeposition」、「(PDF)NewDevelopmentofAtomicLayerDeposition」、「Newdevelopmentofatomiclayerdeposition」、「Reviewofatomiclayerdepositionprocess」、「AdvancesinAtomicLayerD...
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New development of atomic layer deposition
https://www.tandfonline.com
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
(PDF) New Development of Atomic Layer Deposition
https://www.researchgate.net
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
New development of atomic layer deposition
https://www.tandfonline.com
ABSTRACT. Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities.
Review of atomic layer deposition process
https://www.sciencedirect.com
The six stages of process development of atomic layer deposition are ... New development of atomic layer deposition: processes, methods and applications.
Advances in Atomic Layer Deposition
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Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting ...
Recent Developments of Atomic Layer Deposition ...
https://onlinelibrary.wiley.co
Deposition technologies for TCO films have been established using various techniques, such as magnetron sputtering, pulsed laser deposition, CVD ...