Phase shift mask:Phase
Phase
Phase-shiftmasksarephotomasksthattakeadvantageoftheinterferencegeneratedbyphasedifferencestoimproveimageresolutioninphotolithography.。其他文章還包含有:「2.4.2Phase」、「AlternatingAperturePhaseShiftMasks」、「Attenuatedphaseshiftmasks」、「DepthofFocusandtheAlternatingPhaseShiftMask」、「Phase」、「【光刻】相移掩模PhaseShiftMask(PSM)」、「光罩」、「用於次25奈米極紫外光曝光機之新穎反射型衰減...
查看更多 離開網站2.4.2 Phase
https://www.iue.tuwien.ac.at
Adding a phase-shifting function to the on-off property of binary masks yields a higher resolution at the same or even larger amount of depth of focus. Thus ...
Alternating Aperture Phase Shift Masks
https://www.photomask.com
The key principle used in Phase Shift Masks is that light passing through any media will undergo a phase shift proportional to the thickness of the material.
Attenuated phase shift masks
https://www.spiedigitallibrary
We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the imaging ...
Depth of Focus and the Alternating Phase Shift Mask
http://www.lithoguru.com
One of the biggest advantages of the use of a strong phase shifting mask, such as the alternating. PSM, is the increased depth of focus of fine pitch ...
Phase
https://spie.org
A phase-shift mask relies on the fact that light passing through a transparent media will undergo a phase change as a function of its optical thickness, the ...
【光刻】相移掩模Phase Shift Mask (PSM)
http://www.chipmanufacturing.o
相移掩模(Phase Shift Mask, PSM)是同时利用光线的强度和相位来成像,得到更高分辨率的一种分辨率增强技术[1]。 相移掩模种类很多,其改善光刻分辨力的 ...
光罩
https://finex-tech.com.tw
PSM為Phase Shift Mask(相位差光罩),膜種由原本Cr膜變更為Phase Shift膜,以下簡稱PS膜。 此材料特點在於當光線經過glass及PS膜後其波長會有180度的相位反轉,利用 ...
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩
https://www.tiri.narl.org.tw
相位移光罩(phase-shifting-mask) 是目前一種極為重要的解析度增益技術,它將被應用於未來. 的極紫外光(EUV) 微影術中,以製作25 nm 以下的圖案。
相轉移光罩技術
https://www.materialsnet.com.t
一般而言,相轉移光罩常被用來. 延伸現有曝光設備的壽命,例如使用I- line Stepper及I-line PSM以延後DUV. Scanner須要的時間,以節省成本。 接觸窗一般是整套光罩中最先使用.