Phase shift mask:Depth of Focus and the Alternating Phase Shift Mask
Depth of Focus and the Alternating Phase Shift Mask
由CAMack著作·被引用6次—Oneofthebiggestadvantagesoftheuseofastrongphaseshiftingmask,suchasthealternating.PSM,istheincreaseddepthoffocusoffinepitch ...。其他文章還包含有:「2.4.2Phase」、「AlternatingAperturePhaseShiftMasks」、「Attenuatedphaseshiftmasks」、「Phase」、「Phase」、「【光刻】相移掩模PhaseShiftMask(PSM)」、「光罩」、「用於次25奈米極紫外光曝光機之新穎反射型衰減式相位移光罩」、「相轉...
查看更多 離開網站2.4.2 Phase
https://www.iue.tuwien.ac.at
Adding a phase-shifting function to the on-off property of binary masks yields a higher resolution at the same or even larger amount of depth of focus. Thus ...
Alternating Aperture Phase Shift Masks
https://www.photomask.com
The key principle used in Phase Shift Masks is that light passing through any media will undergo a phase shift proportional to the thickness of the material.
Attenuated phase shift masks
https://www.spiedigitallibrary
We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the imaging ...
Phase
https://en.wikipedia.org
Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography.
Phase
https://spie.org
A phase-shift mask relies on the fact that light passing through a transparent media will undergo a phase change as a function of its optical thickness, the ...
【光刻】相移掩模Phase Shift Mask (PSM)
http://www.chipmanufacturing.o
相移掩模(Phase Shift Mask, PSM)是同时利用光线的强度和相位来成像,得到更高分辨率的一种分辨率增强技术[1]。 相移掩模种类很多,其改善光刻分辨力的 ...
光罩
https://finex-tech.com.tw
PSM為Phase Shift Mask(相位差光罩),膜種由原本Cr膜變更為Phase Shift膜,以下簡稱PS膜。 此材料特點在於當光線經過glass及PS膜後其波長會有180度的相位反轉,利用 ...
用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩
https://www.tiri.narl.org.tw
相位移光罩(phase-shifting-mask) 是目前一種極為重要的解析度增益技術,它將被應用於未來. 的極紫外光(EUV) 微影術中,以製作25 nm 以下的圖案。
相轉移光罩技術
https://www.materialsnet.com.t
一般而言,相轉移光罩常被用來. 延伸現有曝光設備的壽命,例如使用I- line Stepper及I-line PSM以延後DUV. Scanner須要的時間,以節省成本。 接觸窗一般是整套光罩中最先使用.