Phase shift mask：用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩

用於次25 奈米極紫外光曝光機之新穎反射型衰減式相位移光罩

相位移光罩(phase-shifting-mask)是目前一種極為重要的解析度增益技術，它將被應用於未來.的極紫外光(EUV)微影術中，以製作25nm以下的圖案。。其他文章還包含有：「2.4.2Phase」、「AlternatingAperturePhaseShiftMasks」、「Attenuatedphaseshiftmasks」、「DepthofFocusandtheAlternatingPhaseShiftMask」、「Phase」、「Phase」、「【光刻】相移掩模PhaseShiftMask(PSM)」、「光罩」、「相轉移光罩技術」

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2.4.2 Phase

https://www.iue.tuwien.ac.at

Adding a phase-shifting function to the on-off property of binary masks yields a higher resolution at the same or even larger amount of depth of focus. Thus ...

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Alternating Aperture Phase Shift Masks

https://www.photomask.com

The key principle used in Phase Shift Masks is that light passing through any media will undergo a phase shift proportional to the thickness of the material.

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Attenuated phase shift masks

https://www.spiedigitallibrary

We review published research on attenuated phase shift masks (attPSM) for EUV with special emphasis on modeling and fundamental understanding of the imaging ...

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Depth of Focus and the Alternating Phase Shift Mask

http://www.lithoguru.com

One of the biggest advantages of the use of a strong phase shifting mask, such as the alternating. PSM, is the increased depth of focus of fine pitch ...

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Phase

https://en.wikipedia.org

Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography.

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Phase

https://spie.org

A phase-shift mask relies on the fact that light passing through a transparent media will undergo a phase change as a function of its optical thickness, the ...

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