EKC clean

「EKC clean」熱門搜尋資訊

「EKC clean」文章包含有：「CN105529284A」、「EKC4000PCT」、「POLYMERRESIDUEREMOVER」、「SpecializedRemoversandCleanChemistries」、「使用EKC®化学品去除蚀刻残留物」、「半导体晶圆的清洗方法」、「工學院半導體材料與製程設備學程」、「最常使用之晶圓表面清潔步驟為濕式化學法(wetchemistry)」、「湿法EKC清洗机」

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CN105529284A

https://patents.google.com

本发明提供了一种抛光及清洗晶圆的半导体设备，包括前端模组、测量模组、CMP抛光模组和清洗模组，在清洗模组中设置有EKC清洗单元，能够对放入其内的晶圆进行EKC溶液的清洗 ...

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EKC 4000 PCT

https://www.dupont.com

DuPont's post-etch residue removers are aqueous and semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces.

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POLYMER RESIDUE REMOVER

https://www.vaisala.com

After EKC clean, there is an IPA/Dry process where IPA may get contaminated with EKC traces. The Semicon. Refractometer can monitor the concentration of the.

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Specialized Removers and Clean Chemistries

https://www.dupont.com

Our advanced clean chemistries provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post ...

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